US Patent 12080558 Low temperature deposition of pure molybdenum films
Patent 12080558 was granted and assigned to Applied Materials on September, 2024 by the United States Patent and Trademark Office.
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US Patent 12080558 Low temperature deposition of pure molybdenum films
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Patent abstract
Methods for depositing molybdenum films on a substrate are described. The substrate is exposed to a molybdenum halide precursor and an aluminum precursor to form the molybdenum film (e.g., elemental molybdenum) at a low temperature. The exposures can be sequential or simultaneous.
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Patent Number
Patent Inventor Names
Dmitrii Leshchev0
Jose Alexandro Romero0
Kunal Bhatnagar0
Mohith Verghese0
Date of Patent
September 3, 2024
0Patent Application Number
183795150
Date Filed
October 12, 2023
0Patent Citations
Patent Primary Examiner
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