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US Patent 12070769 Liquid processing apparatus and liquid processing method

Patent 12070769 was granted and assigned to Tokyo Electron on August, 2024 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Tokyo Electron
Tokyo Electron
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Date Filed
March 31, 2023
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Date of Patent
August 27, 2024
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Patent Applicant
Tokyo Electron
Tokyo Electron
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Patent Application Number
18129150
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Patent Citations
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US Patent 9192878 Liquid processing apparatus
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US Patent 6878216 Substrate processing method and substrate processing system
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US Patent 7004185 Liquid loading techniques
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US Patent 8807072 Coating device
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US Patent 10755950 Substrate processing apparatus
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US Patent 10910234 Substrate processing apparatus
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US Patent 11033925 Device for the surface coating of pieces
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US Patent 11088035 Fabrication of thin-film encapsulation layer for light emitting device
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US Patent 11208725 Substrate processing apparatus
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US Patent 11273464 Substrate processing apparatus
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•••
Patent Inventor Names
Chikara Nobukuni
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Takuya Itahashi
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Shota Wakayama
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Tomoaki Ojima
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Ryoichi Horiguchi
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12070769
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Patent Primary Examiner
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Jethro M. Pence
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