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US Patent 12068132 Radio-frequency power supply apparatus

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
September 1, 2022
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Date of Patent
August 20, 2024
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Patent Application Number
17901477
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Patent Citations
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US Patent 9236228 Frequency enhanced impedance dependent power control for multi-frequency RF pulsing
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US Patent 9812294 Sub-pulsing during a state
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US Patent 9831065 Computation of statistics for statistical data decimation
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US Patent 9831071 Systems and methods for using multiple inductive and capacitive fixtures for applying a variety of plasma conditions to determine a match network model
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US Patent 9837252 Systems and methods for using one or more fixtures and efficiency to determine parameters of a match network model
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US Patent 9842725 Using modeling to determine ion energy associated with a plasma system
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US Patent 9947514 Plasma RF bias cancellation system
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US Patent 9960015 Impedance-based adjustment of power and frequency
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US Patent 9997333 Sub-pulsing during a state
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US Patent 10304669 Adaptive counter measure control thwarting IMD jamming impairments for RF plasma systems
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•••
Patent Inventor Names
Tatsuya Morii
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Yuichi Hasegawa
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12068132
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Patent Primary Examiner
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Tuan T. Lam
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CPC Code
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H01J 37/32165
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H01J 37/32183
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H01J 37/3299
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H01J 37/32091
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H01J 37/32926
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H01J 37/32174
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