Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
William E. Quinn0
Siddharth Harikrishna Mohan0
Gregg Kottas0
Gregory McGraw0
Matthew King0
Date of Patent
May 7, 2024
0Patent Application Number
180993390
Date Filed
January 20, 2023
0Patent Citations
...
Patent Primary Examiner
CPC Code
Patent abstract
Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.
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