Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tae Sug Jang0
Hyeon Jeong Kim0
Sang Yoon Park0
Jin Hyung Park0
Date of Patent
April 30, 2024
0Patent Application Number
170776760
Date Filed
October 22, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
Patent abstract
Provided are a polyamic acid resin derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride, and a polyamideimide film including polyamideimide derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride.
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