Log in
Sign up
Golden has been acquired by ComplyAdvantage.Read about it here ⟶
‌

US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing

Patent 11948780 was granted and assigned to Applied Materials on April, 2024 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Current Assignee
Applied Materials
Applied Materials
0
Date Filed
May 12, 2021
0
Date of Patent
April 2, 2024
0
Patent Applicant
Applied Materials
Applied Materials
0
Patent Application Number
17319013
0
Patent Citations
‌
US Patent 6917204 Addition of power at selected harmonics of plasma processor drive frequency
0
‌
US Patent 6947300 Parallel DC-to-AC power inverter system with current sharing technique and method thereof
0
‌
US Patent 6962664 Controlled method for segmented electrode apparatus and method for plasma processing
0
‌
US Patent 6970042 Power control for high frequency amplifiers
0
‌
US Patent 6972524 Plasma processing system control
0
‌
US Patent 7016620 Method and device for controlling a print process with high color density
0
‌
US Patent 7046088 Power amplifier
0
‌
US Patent 7059267 Use of pulsed grounding source in a plasma reactor
0
‌
US Patent 7104217 Plasma processing apparatus
0
‌
US Patent 7115185 Pulsed excitation of inductively coupled plasma sources
0
•••
Patent Inventor Names
Leonid Dorf
0
Linying Cui
0
James Rogers
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
11948780
0
Patent Primary Examiner
‌
Ram N Kackar
0

Find more entities like US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo
By using this site, you agree to our Terms of Service.