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US Patent 11914290 Overlay measurement targets design

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
July 20, 2020
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Date of Patent
February 27, 2024
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Patent Application Number
16933297
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Patent Citations
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US Patent 10228320 Achieving a small pattern placement error in metrology targets
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US Patent 10386176 Metrology method, target and substrate
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US Patent 7042569 Overlay alignment metrology using diffraction gratings
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US Patent 7061615 Spectroscopically measured overlay target
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US Patent 9563131 Lithographic apparatus, substrate and device manufacturing method
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US Patent 9709903 Overlay target geometry for measuring multiple pitches
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US Patent 9812324 Methods to control fin tip placement
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US Patent 9915879 Substrate and patterning device for use in metrology, metrology method and device manufacturing method
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US Patent 9977344 Metrology target, method and apparatus, computer program and lithographic system
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Patent Inventor Names
Hong Xiao
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11914290
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Patent Primary Examiner
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Stewart A Fraser
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CPC Code
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G03F 7/70633
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G03F 1/86
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H01L 21/0273
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G03F 7/70683
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G03F 7/70625
0

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