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US Patent 11906450 Electron diffraction holography

Patent 11906450 was granted and assigned to FEI Company on February, 2024 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Applicant
FEI Company
FEI Company
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Current Assignee
FEI Company
FEI Company
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
119064500
Patent Inventor Names
Yuchen Deng0
Holger Kohr0
Alexander Henstra0
Date of Patent
February 20, 2024
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Patent Application Number
179008630
Date Filed
August 31, 2022
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Patent Citations
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US Patent 11183364 Dual beam microscope system for imaging during sample processing
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US Patent 6882477 Method and system for interference lithography utilizing phase-locked scanning beams
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US Patent 8642959 Method and system of performing three-dimensional imaging using an electron microscope
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US Patent 11460419 Electron diffraction holography
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Patent Primary Examiner
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Nicole M Ippolito
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CPC Code
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G03H 2224/04
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H01J 37/04
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H01J 37/26
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H01J 2237/2614
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G03H 5/00
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G01N 2223/064
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G01N 2223/0566
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G01N 33/385
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Patent abstract

Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

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