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US Patent 11874102 Thick photo resist layer metrology target

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
August 18, 2020
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Date of Patent
January 16, 2024
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Patent Application Number
16996699
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Patent Citations
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US Patent 10527951 Compound imaging metrology targets
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US Patent 9476698 Periodic patterns and technique to control misalignment between two layers
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US Patent 10190979 Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
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US Patent 6982793 Method and apparatus for using an alignment target with designed in offset
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US Patent 7541201 Apparatus and methods for determining overlay of structures having rotational or mirror symmetry
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US Patent 8330281 Overlay marks, methods of overlay mark design and methods of overlay measurements
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US Patent 9214317 System and method of SEM overlay metrology
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Patent Inventor Names
Jincheng Pei
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Lingyi Guo
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11874102
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Patent Primary Examiner
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Isiaka O Akanbi
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CPC Code
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G03F 7/70633
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G03F 7/706
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G03F 7/70625
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G03F 1/36
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G03F 7/70683
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G01B 11/272
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G03F 7/70641
0
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G03F 1/70
0

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