US Patent 11854813 Low temperature deposition of pure molybenum films
Patent 11854813 was granted and assigned to Applied Materials on December, 2023 by the United States Patent and Trademark Office.
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US Patent 11854813 Low temperature deposition of pure molybenum films
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Patent abstract
Methods for depositing molybdenum films on a substrate are described. The substrate is exposed to a molybdenum halide precursor and an aluminum precursor to form the molybdenum film (e.g., elemental molybdenum) at a low temperature. The exposures can be sequential or simultaneous.
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Patent Number
Patent Inventor Names
Dmitrii Leshchev0
Jose Alexandro Romero0
Kunal Bhatnagar0
Mohith Verghese0
Date of Patent
December 26, 2023
0Patent Application Number
171834740
Date Filed
February 24, 2021
0Patent Citations
Patent Primary Examiner
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