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US Patent 11837634 Semiconductor device including superlattice with oxygen and carbon monolayers

Patent 11837634 was granted and assigned to Atomera on December, 2023 by the United States Patent and Trademark Office.

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Atomera
Atomera
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Current Assignee
Atomera
Atomera
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
118376340
Patent Inventor Names
Robert John Stephenson0
Nyles Wynn Cody0
Keith Doran Weeks0
Marek Hytha0
Robert J. Mears0
Hideki Takeuchi0
Date of Patent
December 5, 2023
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Patent Application Number
173050980
Date Filed
June 30, 2021
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Patent Citations
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US Patent 6958486 Semiconductor device including band-engineered superlattice
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US Patent 6993222 Optical filter device with aperiodically arranged grating elements
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US Patent 7018900 Method for making a semiconductor device comprising a superlattice channel vertically stepped above source and drain regions
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US Patent 7033437 Method for making semiconductor device including band-engineered superlattice
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US Patent 7034329 Semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure
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US Patent 7045377 Method for making a semiconductor device including a superlattice and adjacent semiconductor layer with doped regions defining a semiconductor junction
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US Patent 7045813 Semiconductor device including a superlattice with regions defining a semiconductor junction
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US Patent 7071119 Method for making a semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure
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Patent Primary Examiner
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Calvin Y Choi
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CPC Code
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H01L 29/7833
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H01L 21/02381
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H01L 21/0245
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H01L 21/02488
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H01L 21/02507
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H01L 21/02532
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H01L 21/0262
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H01L 29/152
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Patent abstract

A semiconductor device may include a semiconductor layer and a superlattice adjacent the semiconductor layer. The superlattice may include a plurality of stacked groups of layers, with each group of layers comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The at least one non-semiconductor monolayer in a first group of layers of the superlattice may comprise oxygen and be devoid of carbon, and the at least one non-semiconductor monolayer in a second group of layers of the superlattice may comprise carbon.

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