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US Patent 11791133 Plasma generating apparatus and method for operating same

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Patent abstractTimelineTable: Further ResourcesReferences
Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11791133
Patent Inventor Names
Yun Seong Lee
Se Hong Park
Sae Hoon Uhm
Yeong Hoon Sohn
Date of Patent
October 17, 2023
Patent Application Number
18055640
Date Filed
November 15, 2022
Patent Citations
‌
US Patent 10325758 Plasma processing apparatus
‌
US Patent 9953811 Plasma processing method
‌
US Patent 10541114 Inductive coil structure and inductively coupled plasma generation system
‌
US Patent 7404879 Ionized physical vapor deposition apparatus using helical self-resonant coil
‌
US Patent 9627181 Plasma processing apparatus
Patent Primary Examiner
‌
Tung X Le
CPC Code
‌
H01J 37/32449
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H01J 37/32697
‌
H01J 37/3211
‌
H01J 37/32183
‌
H01J 37/32825
Patent abstract

A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.

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