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US Patent 11756773 Plasma processing apparatus

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
October 28, 2021
Date of Patent
September 12, 2023
Patent Application Number
17452640
Patent Citations
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US Patent 8293068 Plasma processing apparatus
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US Patent 10544505 Deposition or treatment of diamond-like carbon in a plasma reactor
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US Patent 10553406 Plasma generating apparatus and substrate processing apparatus
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US Patent 10685810 RF antenna producing a uniform near-field Poynting vector
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US Patent 10879043 Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
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US Patent 11013075 RF apparatus with arc prevention using non-linear devices
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US Patent 11114287 Radical output monitor for a remote plasma source and method of use
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US Patent 11170991 Plasma processing apparatus
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US Patent 11315765 Plasma processing apparatus and plasma processing method
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US Patent 11569070 Plasma processing apparatus
•••
Patent Inventor Names
Tadashi Inoue
Nobuaki Tsuchiya
Kazunari Sekiya
Tatsunori Sato
Hiroshi Sasamoto
Masaharu Tanabe
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11756773
Patent Primary Examiner
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Srinivas Sathiraju

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