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US Patent 11756768 High-frequency power supply system
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Patent
Date Filed
December 17, 2021
Date of Patent
September 12, 2023
Patent Application Number
17554609
Patent Citations
US Patent 9236228 Frequency enhanced impedance dependent power control for multi-frequency RF pulsing
US Patent 9720022 Systems and methods for providing characteristics of an impedance matching model for use with matching networks
US Patent 9779196 Segmenting a model within a plasma system
US Patent 9812294 Sub-pulsing during a state
US Patent 9831065 Computation of statistics for statistical data decimation
US Patent 9831071 Systems and methods for using multiple inductive and capacitive fixtures for applying a variety of plasma conditions to determine a match network model
US Patent 9837252 Systems and methods for using one or more fixtures and efficiency to determine parameters of a match network model
US Patent 9842725 Using modeling to determine ion energy associated with a plasma system
US Patent 9947514 Plasma RF bias cancellation system
US Patent 9960015 Impedance-based adjustment of power and frequency
•••
Patent Citations Received
US Patent 12136938 Closed-loop multiple-output radio frequency (RF) matching
0
US Patent 12068132 Radio-frequency power supply apparatus
0
US Patent 11994542 RF signal parameter measurement in an integrated circuit fabrication chamber
0
US Patent 11984298 Impedance transformation in radio-frequency-assisted plasma generation
0
Patent Inventor Names
Yuichi Hasegawa
Yuya Ueno
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11756768
Patent Primary Examiner
Henry Luong
CPC Code
H01J 37/32183
H01J 37/32155
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