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US Patent 11755814 Method and apparatus for layout pattern selection

Overview Structured Data Issues Contributors

Is a

Date Filed

January 10, 2020

Date of Patent

September 12, 2023

Patent Application Number

17422520

Patent Citations

US Patent 8336006 Mask-layout creating method, apparatus therefor, and computer program product

US Patent 10386726 Geometry vectorization for mask process correction

US Patent 10198550 SRAF insertion with artificial neural network

US Patent 11403564 Lithographic hotspot detection using multiple machine learning kernels

US Patent 7587704 System and method for mask verification using an individual mask error model

US Patent 8200468 Methods and system for lithography process window simulation

Patent Citations Received

US Patent 12019974 Geometric mask rule check with favorable and unfavorable zones

0

Patent Inventor Names

Wei-jie Chen

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Leigh M. Garbowski

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