US Patent 11747302 Method and system for detecting a material response

Disclosed herein is a method of detecting a material response. The method includes providing an oscillating primary magnetic field to cause as ample to produce a secondary magnetic field. The method also includes reducing the effect on an atomic magnetometer of components of the primary and secondary magnetic fields in a direction substantially orthogonal to a surface of the sample. The method also includes detecting the secondary magnetic field with the atomic magnetometer to detect the material response.