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US Patent 11705252 Vacuum chamber arrangement for charged particle beam generator

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Is a
Patent
Patent
0

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
117052520
Date of Patent
July 18, 2023
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Patent Application Number
174038490
Date Filed
August 16, 2021
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Patent Citations
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US Patent 8089056 Projection lens arrangement
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US Patent 8198602 Electrostatic lens structure
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US Patent 8445869 Projection lens arrangement
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US Patent 8502174 Method of and system for exposing a target
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US Patent 8502176 Imaging system
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US Patent 8653485 Projection lens arrangement
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US Patent 8586949 Charged particle lithography system with intermediate chamber
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US Patent 8669534 Electrostatic lens for charged particle radiation
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Patent Primary Examiner
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David E Smith
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CPC Code
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H01J 37/147
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H01J 37/3007
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H01J 37/3177
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H01J 37/09
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H01J 37/302
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H01J 2237/002
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H01J 2237/16
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H01J 2237/026
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...

The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

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