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US Patent 11691172 Liquid processing apparatus and liquid processing method

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Tokyo Electron
Tokyo Electron
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Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
116911720
Date of Patent
July 4, 2023
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Patent Application Number
169186780
Date Filed
July 1, 2020
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Patent Citations
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US Patent 10177013 Monocrystal and polycrystal texturing device
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US Patent 10373849 Substrate processing apparatus
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US Patent 10381233 Method and apparatus for substrate processing
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US Patent 10500617 Substrate liquid treatment apparatus, tank cleaning method and non-transitory storage medium
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US Patent 10573539 Substrate liquid processing apparatus
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US Patent 10632491 Liquid ejection device
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US Patent 10755950 Substrate processing apparatus
0
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US Patent 10910234 Substrate processing apparatus
0
...
Patent Primary Examiner
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Jethro M. Pence
0

A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

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