Patent attributes
A hydrogen storage assembly includes at least one wafer formed of a substrate material that produces metal hydride when exposed to a hydrogen-rich carrier fluid. The wafer can be supported by a housing and arranged so that the hydrogen-rich carrier fluid can flow over a reaction surface of the wafer. At least one heating element can be arranged to transfer heat to the wafer to attain an operating temperature suitable for hydrogen charging on the reaction surface. A de-activation material may be provided on the reaction surface for inhibiting formation of surface oxide that impedes hydrogen absorption during charging and hydrogen desorption during discharging. The at least one wafer can include a plurality of monolithic plate wafers spaced apart about a central axis of the assembly. The at least one wafer can include a plurality of monolithic disc wafers in at least one stacked arrangement.
