US Patent 11633968 Low-particle gas enclosure systems and methods
Patent 11633968 was granted and assigned to Kateeva on April, 2023 by the United States Patent and Trademark Office.
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Edits on 14 Aug, 2023
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Patent Inventor Names
Alexander Sou-Kang Ko0
Alexey Stepanov0
Eliyahu Vronsky0
Justin Mauck0
Shandon Alderson0
Edits on 30 Apr, 2023
Golden AI
Edits made to:
Infobox (+10 properties)
Article (+471 characters)
US Patent 11633968 Low-particle gas enclosure systems and methods
Article
A method comprises processing a substrate in a gas enclosure to form a film on one or more portions of the substrate. The method further comprises, while processing the substrate, circulating gas along a circulation path through the gas enclosure. Circulating the gas may comprise flowing gas through an exhaust housing enclosing a printhead assembly housed in the gas enclosure and filtering the gas flowing downstream of the printhead assembly from the exhaust housing.
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Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
116339680
Date of Patent
April 25, 2023
0Patent Application Number
167914080
Date Filed
February 14, 2020
0Patent Primary Examiner
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