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US Patent 11624872 Etched facet in a multi quantum well structure

Patent 11624872 was granted and assigned to Skorpios Technologies on April, 2023 by the United States Patent and Trademark Office.

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Skorpios Technologies
Skorpios Technologies
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Current Assignee
Skorpios Technologies
Skorpios Technologies
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
116248720
Patent Inventor Names
Paveen Apiratikul0
Damien Lambert0
Date of Patent
April 11, 2023
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Patent Application Number
175394740
Date Filed
December 1, 2021
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Patent Citations
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US Patent 10545291 Gain integration in Si photonic coherent modulators
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US Patent 10312661 III-V chip preparation and integration in silicon photonics
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US Patent 11194092 Etched facet in a multi quantum well structure
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Patent Primary Examiner
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Daniel Petkovsek
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CPC Code
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G02B 2006/12128
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G02B 6/136
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G02B 6/12004
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G02B 6/4228
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G02B 2006/12061
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An exemplary multi quantum well structure may include a silicon platform having a pit formed in the silicon platform, a chip positioned inside the pit, a first waveguide formed in the chip, and a second waveguide formed in the silicon platform. The pit may be defined at least in part by a sidewall and a base. The chip may include a first side and a first recess in the first side. The first side may be defined in part by a first cleaved or diced facet. The first recess may be defined in part by a first etched facet. The first waveguide may be configured to guide an optical beam to pass through the first etched facet. The second waveguide may be configured to guide the optical beam to pass through the sidewall. The second waveguide may be optically aligned with the first waveguide.

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