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US Patent 11604420 Self-calibrating overlay metrology

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
September 28, 2021
Date of Patent
March 14, 2023
Patent Application Number
17488010
Patent Citations
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US Patent 10101670 Statistical model-based metrology
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US Patent 10352695 X-ray scatterometry metrology for high aspect ratio structures
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US Patent 10013518 Model building and analysis engine for combined X-ray and optical metrology
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US Patent 10324050 Measurement system optimization for X-ray based metrology
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11604420
Patent Primary Examiner
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Christopher G Young
CPC Code
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G03F 7/70516
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G03F 7/70633
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G03F 7/70775

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