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US Patent 11569070 Plasma processing apparatus

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Patent Citations Received
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US Patent 11756773 Plasma processing apparatus
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
115690700
Date of Patent
January 31, 2023
0
Patent Application Number
167201540
Date Filed
December 19, 2019
0
Patent Citations
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US Patent 11114287 Radical output monitor for a remote plasma source and method of use
0
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US Patent 11170991 Plasma processing apparatus
0
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US Patent 10081869 Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates
0
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US Patent 10083817 Linear remote plasma source
0
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US Patent 10157729 Soft pulsing
0
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US Patent 10224463 Film forming method, method of manufacturing semiconductor light-emitting device, semiconductor light-emitting device, and illuminating device
0
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US Patent 10231321 State-based adjustment of power and frequency
0
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US Patent 10354838 RF antenna producing a uniform near-field Poynting vector
0
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US Patent 10410889 Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors
0
‌
US Patent 10544505 Deposition or treatment of diamond-like carbon in a plasma reactor
0
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US Patent 10553406 Plasma generating apparatus and substrate processing apparatus
0
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US Patent 10685810 RF antenna producing a uniform near-field Poynting vector
0
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US Patent 10879043 Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
0
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US Patent 11013075 RF apparatus with arc prevention using non-linear devices
0
‌
US Patent 11315765 Plasma processing apparatus and plasma processing method
0
Patent Primary Examiner
‌
Amy Cohen Johnson
0
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Article (+454 characters)
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 US Patent 11569070 Plasma processing apparatus

Article

A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.

Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
115690700
Date of Patent
January 31, 2023
0
Patent Application Number
167201540
Date Filed
December 19, 2019
0
Patent Citations
‌
US Patent 11114287 Radical output monitor for a remote plasma source and method of use
0
‌
US Patent 11170991 Plasma processing apparatus
0
‌
US Patent 10081869 Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates
0
‌
US Patent 10083817 Linear remote plasma source
0
‌
US Patent 10157729 Soft pulsing
0
‌
US Patent 10224463 Film forming method, method of manufacturing semiconductor light-emitting device, semiconductor light-emitting device, and illuminating device
0
‌
US Patent 10231321 State-based adjustment of power and frequency
0
‌
US Patent 10354838 RF antenna producing a uniform near-field Poynting vector
0
‌
US Patent 10410889 Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors
0
‌
US Patent 10544505 Deposition or treatment of diamond-like carbon in a plasma reactor
0
‌
US Patent 10553406 Plasma generating apparatus and substrate processing apparatus
0
‌
US Patent 10685810 RF antenna producing a uniform near-field Poynting vector
0
‌
US Patent 10879043 Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
0
‌
US Patent 11013075 RF apparatus with arc prevention using non-linear devices
0
‌
US Patent 11315765 Plasma processing apparatus and plasma processing method
0
Patent Primary Examiner
‌
Amy Cohen Johnson
0

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