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US Patent 11531275 Parallel scatterometry overlay metrology

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
August 25, 2021
Date of Patent
December 20, 2022
Patent Application Number
17411539
Patent Citations
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US Patent 11073768 Metrology target for scanning metrology
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US Patent 10551749 Metrology targets with supplementary structures in an intermediate layer
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US Patent 10371626 System and method for generating multi-channel tunable illumination from a broadband source
Patent Citations Received
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US Patent 12111580 Optical metrology utilizing short-wave infrared wavelengths
0
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US Patent 11841621 Moiré scatterometry overlay
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11531275
Patent Primary Examiner
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Peter B. Kim
CPC Code
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G03F 7/70633
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G01B 11/272
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G03F 7/70491
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G03F 9/7088

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