US Patent 11515122 System and methods for VHF plasma processing
Patent 11515122 was granted and assigned to Tokyo Electron on November, 2022 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
March 19, 2019
0
Date of Patent
November 29, 2022
0
Patent Applicant
Patent Application Number
16357731
0
Patent Inventor Names
Barton Lane
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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