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US Patent 11501955 Modular high-frequency source with integrated gas distribution

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Current Assignee
Applied Materials
Applied Materials
Date Filed
February 1, 2021
Date of Patent
November 15, 2022
Patent Applicant
Applied Materials
Applied Materials
Patent Application Number
17164703
Patent Citations
‌
US Patent 10615007 Plasma reactor with non-power-absorbing dielectric gas shower plate assembly
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US Patent 10541145 Substrate processing apparatus and substrate processing method
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US Patent 10130958 Showerhead assembly with gas injection distribution devices
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US Patent 10316409 Radical source design for remote plasma atomic layer deposition
‌
US Patent 10403476 Active showerhead
‌
US Patent 10465288 Nozzle for uniform plasma processing
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US Patent 10480074 Apparatus for radical-based deposition of dielectric films
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11501955
Patent Primary Examiner
‌
Rudy Zervigon
CPC Code
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H01J 2237/3321
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H01J 2237/334
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H01J 37/3244
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H01J 37/3211
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C23C 16/455
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H01J 2237/335
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H01J 37/32082

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