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US Patent 11498841 Method for producing highly dispersed silicon dioxide

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Patent Applicant
Wacker Chemie AG
Wacker Chemie AG
Current Assignee
Wacker Chemie AG
Wacker Chemie AG
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11498841
Date of Patent
November 15, 2022
Patent Application Number
16630608
Date Filed
July 13, 2017
Patent Primary Examiner
‌
Colin W. Slifka

An economic process for producing high quality finely divided silicon dioxide from mixtures comprising economical silicon compounds without operational disturbances is characterized by using as an Si source mixture of at least two silicon compounds, at least one being carbon-containing and at least one being carbon-free, supplying a fuel gas and an oxygen-containing source, the molar C/Si ratio of this mixture being between 10/BET and 35/BET, and the molar H/Cl ratio of this mixture being between 0.45+(BET/600) and 0.95+(BET/600), with BET being the specific surface area of the pyrogenic silicon dioxide under production, introducing this mixture as the main flow into a reaction space and igniting and reacting it, and isolating the resulting solid.

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