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US Patent 11483919 System of electron irradiation

Patent 11483919 was granted and assigned to Huazhong University of Science and Technology on October, 2022 by the United States Patent and Trademark Office.

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Patent
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Patent attributes

Current Assignee
Huazhong University of Science and Technology
Huazhong University of Science and Technology
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
114839190
Patent Inventor Names
Jun Yang0
Chen Zuo0
Jiang Huang0
Yongqian Xiong0
Tiaoqin Yu0
Mingwu Fan0
Lige Zhang0
Date of Patent
October 25, 2022
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Patent Application Number
166679090
Date Filed
October 30, 2019
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Patent Primary Examiner
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David A. Vanore
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CPC Code
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H05H 2007/007
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H05H 2007/043
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H05H 7/04
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H05H 7/001
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H01F 7/0278
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A system of electron irradiation includes an electron accelerator and an electron beam focusing device. The electron accelerator emits and accelerates a beam of electrons. The electron beam focusing device is located at a rear end of the electron irradiation and includes a beam restraining rail and 2n+1 sets of magnetic poles. The beam restraining rail forms a beam restraining channel through which the beam of electrons are to pass. The 2n+1 sets of magnetic poles are installed on the beam restraining rail and distributed at different locations of the beam restraining channel. An nth set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a first direction. An (n+1)th set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a second direction. The second direction is perpendicular to the first direction. The n is a positive integer.

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