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US Patent 11462392 Plasma processing apparatus
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Patent
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Date Filed
December 19, 2019
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Date of Patent
October 4, 2022
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Patent Application Number
16720262
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Patent Citations
US Patent 10157729 Soft pulsing
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US Patent 10224463 Film forming method, method of manufacturing semiconductor light-emitting device, semiconductor light-emitting device, and illuminating device
US Patent 10231321 State-based adjustment of power and frequency
US Patent 10354838 RF antenna producing a uniform near-field Poynting vector
US Patent 10410889 Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors
US Patent 10544505 Deposition or treatment of diamond-like carbon in a plasma reactor
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US Patent 10553406 Plasma generating apparatus and substrate processing apparatus
US Patent 10685810 RF antenna producing a uniform near-field Poynting vector
US Patent 10879043 Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
US Patent 11013075 RF apparatus with arc prevention using non-linear devices
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Patent Inventor Names
Tatsunori Sato
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Masaharu Tanabe
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Nobuaki Tsuchiya
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Tadashi Inoue
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Hiroshi Sasamoto
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Kazunari Sekiya
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11462392
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Patent Primary Examiner
Srinivas Sathiraju
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