US Patent 11460771 Protective film forming composition having an acetal structure
Patent 11460771 was granted and assigned to Nissan Chemical Corporation on October, 2022 by the United States Patent and Trademark Office.
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Edits on 16 Oct, 2023
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Patent Inventor Names
Takafumi Endo0
Takahiro Kishioka0
Yasunobu Someya0
Edits on 8 Oct, 2022
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US Patent 11460771 Protective film forming composition having an acetal structure
Article
A protective film-forming composition which protects against a semiconductor wet etching solution, contains a solvent and a compound or polymer thereof containing at least one acetal structure in a molecule thereof, and forms a protective film exhibiting excellent resistance against a semiconductor wet etching solution during the lithographic process when producing semiconductors; a method for producing a resist pattern-equipped substrate which uses the protective film; and a method for producing a semiconductor device.
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Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
114607710
Date of Patent
October 4, 2022
0Patent Application Number
169553090
Date Filed
December 20, 2018
0Patent Primary Examiner
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