Patent 11450370 was granted and assigned to Taiwan Semiconductor Manufacturing Company on September, 2022 by the United States Patent and Trademark Office.
A memory device includes a plurality of memory cells. Each memory cell includes a multi-gate FeFET that has a first source/drain terminal, a second source/drain terminal, and a gate with a plurality of ferroelectric layers configured such that each of the ferroelectric layers has a respective unique switching E-field.