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US Patent 11384446 Compositions and methods for the electrodeposition of nanotwinned copper

Patent 11384446 was granted and assigned to MacDermid on July, 2022 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
MacDermid
MacDermid
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Current Assignee
MacDermid
MacDermid
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
113844460
Patent Inventor Names
Elie H. Najjar0
Thomas B. Richardson0
Kyle M. Whitten0
Jianwen Han0
Pingping Ye0
Stephan I. Braye0
Date of Patent
July 12, 2022
0
Patent Application Number
170054070
Date Filed
August 28, 2020
0
Patent Citations
‌
US Patent 10566314 Microstructure modulation for metal wafer-wafer bonding
Patent Primary Examiner
‌
Wojciech Haske
0

A copper electroplating solution comprising a copper salt, a source of halide ions, and a linear or branched polyhydroxyl. The copper electroplating solution is used to deposit copper having a high density of nanotwinned columnar copper grains on a substrate. The linear or branched polyhydroxyl may comprise a reaction product between 2,3-epoxy-1-propanol and aminic alcohol or ammonium alcohol.

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