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US Patent 11380520 RF power delivery to vacuum plasma processing

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
October 26, 2018
Date of Patent
July 5, 2022
Patent Application Number
16763575
Patent Citations
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US Patent 10056230 Power supply system, plasma processing apparatus and power supply control method
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US Patent 10141163 Controlling ion energy within a plasma chamber
0
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US Patent 10128085 Method of plasma etching
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US Patent 10157729 Soft pulsing
0
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US Patent 10424461 Controlling ion energy within a plasma chamber
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US Patent 10347515 Method for manufacturing workpieces and apparatus
Patent Inventor Names
Martin Bless
0
Stefan Rhyner
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11380520
Patent Primary Examiner
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Srinivas Sathiraju

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