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US Patent 11367296 Layout analysis

Patent 11367296 was granted and assigned to NextVPU (Shanghai) Co., Ltd. on June, 2022 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
NextVPU (Shanghai) Co., Ltd.
NextVPU (Shanghai) Co., Ltd.
0
Current Assignee
NextVPU (Shanghai) Co., Ltd.
NextVPU (Shanghai) Co., Ltd.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
113672960
Patent Inventor Names
Haijiao Cai0
Ji Zhou0
Linfeng Li0
Xinpeng Feng0
Date of Patent
June 21, 2022
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Patent Application Number
173510800
Date Filed
June 17, 2021
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Patent Primary Examiner
‌
Sean T Motsinger
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CPC Code
‌
G06T 7/11
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G06V 2201/131
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A layout analysis method, an electronic device, and a non-transitory computer-readable storage medium are provided. The layout analysis method includes: obtaining coordinate information of a plurality of text lines in an image; creating a layout model of the image according to the coordinate information; analyzing a layout structure of the text lines based on the layout model; and determining an order of the text lines relative to each other based on the layout structure.

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