Patent attributes
Provided is a resistive random-access memory device, including: multiple pillars, extending in a vertical direction with respect to a main surface of a substrate; multiple bit lines, extending in a horizontal direction with respect to the main surface of the substrate; and a memory cell, formed at an intersection of the pillars and the bit lines. The memory cell includes a gate insulating film formed on an outer periphery of the pillars, a semiconductor film formed on an outer periphery of the gate insulating film and providing a channel region, and a variable resistance element formed on a part of an outer periphery of the semiconductor film. An electrode region of an outer periphery of the variable resistance element is connected to one of a pair of adjacent bit lines, and the semiconductor film is connected to the other of the pair of adjacent bit lines.
