Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shigeru Shirayone0
Kazuyuki Ikenaga0
Masahiro Sumiya0
Masaki Ishiguro0
Tomoyuki Tamura0
Date of Patent
February 22, 2022
Patent Application Number
14788759
Date Filed
June 30, 2015
Patent Citations Received
Patent Primary Examiner
Patent abstract
A plasma processing apparatus includes: a plasma processing chamber; a radio frequency power source; a sample stage on which a sample is mounted; an electrode which is arranged inside the sample stage and electrostatically chucks the sample; a DC power source which applies a DC voltage to the electrode; and a control device which controls an output voltage of the DC power source so that an electric potential difference between an electric potential of the sample and an electric potential of an inner wall of the plasma processing chamber is reduced to an electric potential difference within a predetermined range during interruption of plasma discharge.
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