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US Patent 11226251 Method of making a dual-cavity pressure sensor die

Patent 11226251 was granted and assigned to Chinese Academy of Sciences on January, 2022 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
Chinese Academy of Sciences
Chinese Academy of Sciences
Current Assignee
Chinese Academy of Sciences
Chinese Academy of Sciences
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11226251
Patent Inventor Names
Yiming Zhang0
Fan Zeng0
Kevin Chau0
Man Wong0
Date of Patent
January 18, 2022
Patent Application Number
17023734
Date Filed
September 17, 2020
Patent Primary Examiner
‌
Hsien-Ming Lee
Patent abstract

A pressure sensor die especially suitable for high-temperature, high-pressure operating environment and delivering accurate and reliable pressure measurement at low cost. A single crystalline silicon includes a cap, a substrate and a base connected together. A recess formed on the cap creates an upper sealed cavity with the substrate. A silicon oxide layer is formed between the substrate and the cap. A recess formed on the base creates a lower sealed cavity with the substrate. The upper sealed cavity and the lower sealed cavity overlap in their projections. The substrate includes at least two sets of piezoresistive sensing elements located within the overlapping projections, perpendicular to each other, and oriented in different crystallographic directions.

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