US Patent 11222772 Substrate processing apparatus
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Patent abstract
A substrate processing apparatus includes a partition comprising at least one through-hole, a conduit arranged in the partition through the through-hole, a gas supply unit connected to the conduit, and a low dielectric material provided between a side wall of the through-hole and the conduit.
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Patent Number
112227720
Date of Patent
January 11, 2022
0Patent Application Number
158353280
Date Filed
December 7, 2017
0Official Website
Patent Citations Received
Patent Primary Examiner
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Patent Jurisdiction
Patent Number
112227720
Date of Patent
January 11, 2022
0Patent Application Number
158353280
Date Filed
December 7, 2017
0Official Website
Patent Citations Received
Patent Primary Examiner
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US Patent 11222772 Substrate processing apparatus
Infobox
Is a
Patent jurisdiction
Patent number
11222772
Date of patent
January 11, 2022
Patent application number
15835328
Date Filed
December 7, 2017
Patent primary examiner
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