US Patent 11183366 Multi-beam writing method and multi-beam writing apparatus

A multi-beam writing method includes performing the k-th tracking control (k being a natural number) by beam deflection in order to follow movement of the stage while collecting each beam of multiple beams, performing a plurality of shots of the multiple beams by the each beam simultaneously shifting in a rectangular or square irradiation region, which is surrounded by the size of the beam pitch and corresponding to the each beam, while performing the k-th tracking control, and returning, after the period of the k-th tracking control has passed, the tracking position to a position which is obtained by adding an offset of an integer multiple of the size of the beam pitch to the tracking starting position of the k-th tracking control where the k-th tracking control started, to be as a starting position of the (k+1)th tracking control.