US Patent 11171017 Shutter disk

Patent 11171017 was granted and assigned to Applied Materials on November, 2021 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

11171017

Date of Patent

November 9, 2021

Patent Application Number

20200903

Date Filed

September 3, 2020

Patent Primary Examiner

‌

Alexander G Ghyka

Patent abstract

Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.