Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Praket P. Jha0
Wenhui Li0
Jingmei Liang0
Jinrui Guo0
Jung Chan Lee0
Date of Patent
November 9, 2021
0Patent Application Number
202101120
Date Filed
January 12, 2021
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of depositing a silicon-containing material is disclosed. Some embodiments of the disclosure provide films which fill narrow CD features without a seam or void. Some embodiments of the disclosure provide films which form conformally on features with wider CD. Embodiments of the disclosure also provide superior quality films with low roughness, low defects and advantageously low deposition rates.
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