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US Patent 11121271 Microstructure enhanced absorption photosensitive devices

Patent 11121271 was granted and assigned to W&Wsens Devices Inc. on September, 2021 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
W&Wsens Devices Inc.
W&Wsens Devices Inc.
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Current Assignee
W&Wsens Devices Inc.
W&Wsens Devices Inc.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
111212710
Patent Inventor Names
Shih-Ping Wang0
Shih-Yuan Wang0
Date of Patent
September 14, 2021
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Patent Application Number
201908010
Date Filed
August 1, 2019
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Patent Citations Received
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US Patent 12132131 Backside illuminated avalanche photodiode and manufacturing method thereof
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US Patent 11749762 Semiconductor device comprising a photodetector with reduced dark current
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US Patent 11877379 Apparatus and method for guiding charged particles
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US Patent 11927814 Semiconductor photodetector array sensor integrated with optical-waveguide-based devices
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US Patent 11977281 Integrated photonic component for enhanced mode overlap of a 2D phase shifter
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Patent abstract

Lateral and vertical microstructure enhanced photodetectors and avalanche photodetectors are monolithically integrated with CMOS/BiCMOS ASICs and can also be integrated with laser devices using fluidic assembly techniques. Photodetectors can be configured in a vertical PIN arrangement or lateral metal-semiconductor-metal arrangement where electrodes are in an inter-digitated pattern. Microstructures, such as holes and protrusions, can improve quantum efficiency in silicon, germanium and III-V materials and can also reduce avalanche voltages for avalanche photodiodes. Applications include optical communications within and between datacenters, telecommunications, LIDAR, and free space data communication.

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