US Patent 11037763 Member and plasma processing apparatus
Patent 11037763 was granted and assigned to Tokyo Electron on June, 2021 by the United States Patent and Trademark Office.
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Patent abstract
There is provision of a member used in a plasma processing apparatus configured to generate plasma from a gas in a processing vessel and to process a substrate disposed on a mounting base in the processing vessel using the plasma. The member includes a surface exposed to the plasma in the processing vessel in a state installed in the processing vessel, and a coating layer including cobalt which covers a part of the surface.
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Patent Citations Received
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Patent Inventor Names
Masafumi Urakawa0
Masanori Asahara0
Yuki Sugawara0
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Official Website
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
110377630
Date of Patent
June 15, 2021
0Patent Application Number
159893240
Date Filed
May 25, 2018
0Official Website
Patent Primary Examiner
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US Patent 11037763 Member and plasma processing apparatus
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
11037763
Date of patent
June 15, 2021
Patent application number
15989324
Date Filed
May 25, 2018
Patent primary examiner
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