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US Patent 10930503 Geometric control of bottom-up pillars for patterning applications

Patent 10930503 was granted and assigned to Applied Materials on February, 2021 by the United States Patent and Trademark Office.

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Patent abstractTimelineTable: Further ResourcesReferences
Is a
Patent
Patent

Patent attributes

Patent Applicant
Applied Materials
Applied Materials
Current Assignee
Applied Materials
Applied Materials
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10930503
Date of Patent
February 23, 2021
Patent Application Number
16393375
Date Filed
April 24, 2019
Patent Citations
‌
US Patent 10319604 Methods for self-aligned patterning
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US Patent 10083834 Methods of forming self-aligned vias
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US Patent 10319591 Geometric control of bottom-up pillars for patterning applications
‌
US Patent 10319636 Deposition and treatment of films for patterning
Patent Primary Examiner
‌
Lan Vinh
Patent abstract

Processing methods comprising selectively replacing a first pillar material with a second pillar material in a self-aligned process are described. The first pillar material may be grown orthogonally to the substrate surface and replaced with a second pillar material to leave a substantially similar shape and alignment as the first pillar material.

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