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US Patent 10900120 Passivation against vapor deposition

Overview Structured Data Issues Contributors Activity

Is a

Date Filed

July 12, 2018

Date of Patent

January 26, 2021

Patent Application Number

16033952

Patent Citations

US Patent 10014212 Selective deposition of metallic films

US Patent 10041166 Reaction chamber passivation and selective deposition of metallic films

US Patent 10049924 Selective formation of metallic films on metallic surfaces

US Patent 10115603 Removal of surface passivation

US Patent 10186420 Formation of silicon-containing thin films

US Patent 10157786 Selective formation of metallic films on metallic surfaces

US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces

US Patent 10546741 Selective growth method

US Patent 10480064 Reaction chamber passivation and selective deposition of metallic films

Patent Citations Received

US Patent 11446699 Vapor phase deposition of organic films

US Patent 11525184 Dual selective deposition

US Patent 11430656 Deposition of oxide thin films

US Patent 11830732 Selective passivation and selective deposition

0

US Patent 11501965 Plasma enhanced deposition processes for controlled formation of metal oxide thin films

US Patent 11062914 Removal of surface passivation

US Patent 11608557 Simultaneous selective deposition of two different materials on two different surfaces

US Patent 11643720 Selective deposition of silicon oxide on metal surfaces

0

US Patent 11387107 Deposition of organic films

US Patent 11396701 Passivation against vapor deposition

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Elizabeth A Burkhart

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