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US Patent 10790280 Multi-gate device and method of fabrication thereof

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
February 2, 2018
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Date of Patent
September 29, 2020
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Patent Application Number
15887347
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Patent Citations
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US Patent 10103065 Gate metal patterning for tight pitch applications
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US Patent 10128122 Stacked nanowires
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US Patent 10141403 Integrating thin and thick gate dielectric nanosheet transistors on same chip
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US Patent 10157799 Multi-gate device and method of fabrication thereof
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US Patent 10181510 Semiconductor device and method for fabricating the same
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US Patent 10269790 Forming horizontal bipolar junction transistor compatible with nanosheets
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US Patent 10243040 Semiconductor device
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US Patent 10355137 FINFETs with wrap-around silicide and method forming the same
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US Patent 10002939 Nanosheet transistors having thin and thick gate dielectric material
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US Patent 10008575 Semiconductor device and method of fabricating the same
Patent Citations Received
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US Patent 11600625 Semiconductor device having an offset source/drain feature and method of fabricating thereof
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US Patent 11476328 Stacked nanowire or nanosheet gate-all-around device and method for manufacturing the same
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10790280
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Patent Primary Examiner
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Sophia T Nguyen
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