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US Patent 10770349 Critical dimension control for self-aligned contact patterning

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Patent

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Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

10770349

Date of Patent

September 8, 2020

Patent Application Number

15902362

Date Filed

February 22, 2018

Patent Citations

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US Patent 10319604 Methods for self-aligned patterning

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US Patent 10083834 Methods of forming self-aligned vias

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US Patent 10319636 Deposition and treatment of films for patterning

Patent Primary Examiner

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Latanya N Crawford Eason

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