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US Patent 10761423 Chemical composition for tri-layer removal

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Date Filed
October 3, 2017
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Date of Patent
September 1, 2020
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Patent Applicant
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Patent Application Number
15723875
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Patent Citations
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US Patent 10049876 Removal of trilayer resist without damage to underlying structure
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US Patent 10031420 Wet-strippable silicon-containing antireflectant
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US Patent 10665233 Method for operating a server system and for operating a recording device for recording a voice command; server system; recording device; and spoken dialogue system
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10761423
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Patent Primary Examiner
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Duy-Vu N Deo
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