Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
January 28, 2020
Patent Application Number
16222512
Date Filed
December 17, 2018
Patent Citations Received
Patent Primary Examiner
Patent abstract
A projection optical unit for EUV projection lithography has a plurality of mirrors for imaging an object field into an image field with illumination light. At least one of the mirrors is an NI mirror and at least one of the mirrors is a GI mirror. A mirror dimension Dx of the at least one NI mirror in a plane of extent (xz) perpendicular to a plane of incidence (yz) satisfies the following relationship:4 LLWx/IWPVmax<Dx.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
