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US Patent 10497711 Non-volatile memory with reduced program speed variation

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Patent abstractTimelineTable: Further ResourcesReferences
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Patent
Patent
1

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
104977111
Patent Inventor Names
Liang Pang1
Yingda Dong1
Yanli Zhang1
Ashish Baraskar1
Raghuveer Makala1
Date of Patent
December 3, 2019
1
Patent Application Number
158466201
Date Filed
December 19, 2017
1
Patent Citations Received
‌
US Patent 11716847 Three-dimensional NAND memory device with split gates
2
Patent Primary Examiner
‌
Marc Anthony Armand
1
Patent abstract

A three-dimensional non-volatile memory is provided with reduced programming variation across word lines. The gate lengths of word lines decrease from the top to the bottom of the memory hole. Increased programming speeds due to a narrow memory hole are offset by a smaller gate length at corresponding positions. A blocking dielectric thickness may also be varied, independently or in combination with a variable word line thickness. The blocking dielectric is formed with a horizontal thickness that is larger at regions adjacent to the lower word line layers and smaller at regions adjacent to the upper word line layers. The larger thickness at the lower word line layers reduces the programming speed in the memory hole for the lower word lines relative to the upper word lines. A variance in programming speed resulting from differences in memory hole diameter may be offset by a corresponding variance in blocking dielectric thickness.

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